Support services

4.3.1. Reactive ion etching

The VacuTech CPU 500 plasma reactive etching system is available upon discussion for fabrication of structures by means of plasma etching in capacitively rf plasma. 

Contact: Jiří Bulíř / 266052425 /
4.3.1. Reflectance and Transmitance measurements

The reflectance and transmitance of thin films, solids and liquids could be measured by means of UV/Vis/NIR spectrophotometer Lambda 1050 in the spectral range 175-3300 nm in temperature from RT down to 4 K. The spectrophotometer is available for FZU user upon consultation. 

Contact: Jiří Bulíř / 266052425 /