Skip to main content
Insitute of Physics
Home
Experimental Facilities in Physics and Material Science & Engineering
Rozcestník experimentálního vybavení pro fyziku a materiálové vědy

Main menu

  • FZU Facilities
  • FZU Laboratories
  • Czech Facilities
  • World Facilities
  • Facilities under Construction
  • Links
  • News

Search form

1. Characterisation and Testing

1.1. Surface Characterisation
1.2. Electron Microscopy
1.3. X-ray Facilities
1.4. AFM & SPM
1.5. Spectroscopy
1.6. Physical Property (Bulk)
1.7. Lasers
1.8. Sample Preparation
1.9. Other

2. Materials
& Technologies

2.1. Alloy casting
2.2. Crystal growth
2.3. Nanomaterials
2.4. Semiconductors
2.5. Thin films and coatings
2.6. Materials Processing
2.7. Other

3. Workshops

4. Services

4.1. Computing services
4.2. Research services
4.3. Support services
4.4. Other

5. Software

5.1. CAD Software
5.2. Databases general
5.3. FEM software
5.4. Material databases
5.5. Material science
5.6. Mathematics
5.7. Measurement&control
5.8. Project management
5.9. Simulations general
5.10. Theoretical Physics
5.11. Other

Reactive ion etching

The VacuTech CPU 500 plasma reactive etching system is available upon discussion for fabrication of structures by means of plasma etching in capacitively rf plasma. 

Section: 
Optics
Department: 
Analyses of Functional Materials
Contact person: 
Jiří Bulíř
Phone number: 
266052425
E-mail: 
bulir@fzu.cz
Room: 
158
Laboratory: 
Centre for Analysis of Functional Materials
Number: 
1

Category:

  • Support services

© 2014 - FZU AV CR | Log In