Rozcestník experimentálního vybavení pro fyziku a materiálové vědy
Reactive ion etching
The VacuTech CPU 500 plasma reactive etching system is available upon discussion for fabrication of structures by means of plasma etching in capacitively rf plasma.
Section:
Optics
Department:
Analyses of Functional Materials
Contact person:
Jiří Bulíř
Phone number:
266052425
E-mail:
Room:
158
Laboratory:
Number:
1