Rozcestník experimentálního vybavení pro fyziku a materiálové vědy
Silicon-carbon VHF CVD reactor
Very high variable frequency (VHF) chemical vapor deposition (CVD) system for combined silicon and carbon processes and computer-controlled growth of superlattices.
Section:
3
Department:
26
Contact person:
Jan Kočka
Phone number:
220 318 449
E-mail:
Room:
C206/3
Number:
3