The VacuTech CPU 500 plasma reactive etching system is available upon discussion for fabrication of structures by means of plasma etching in capacitively rf plasma.
Rozcestník experimentálního vybavení pro fyziku a materiálové vědy
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4.3.1. Reflectance and Transmitance measurements
The reflectance and transmitance of thin films, solids and liquids could be measured by means of UV/Vis/NIR spectrophotometer Lambda 1050 in the spectral range 175-3300 nm in temperature from RT down to 4 K. The spectrophotometer is available for FZU user upon consultation.
Contact: Jiří Bulíř / 266052425 / bulir@fzu.cz