MicroWriter MLTM is a flexible photolithography machine designed for rapid prototyping and small volume manufacture in R&D. For exposure the 16 UV diode operated at 405 nm are available. The lithography could operate in fast regime with resolution 5 um by means of 15 lasers and precise regime with resolution 0,6 um. To ¨design the structure professional mask design software Clewin 4 is available as weel as spin coater system.